Polysilicon Creation
Raw polycrystalline silicon is created by mixing refined trichlorosilane with hydrogen gas in a reaction furnace and allowing the polycrystalline silicon to grow on the surface of electrically heated tantalum hollow metal wicks.

They then refine the polycrystalline silicon tubes by dissolving them in hydrofluoric acid and produce polysilicon ingots.

Because polycrystalline silicon has randomly oriented crystallites, it doesn't have the electrical characteristics necessary for semiconductor device fabrication. It must first be transformed into single crystal silicon using a process called Crystal Pulling.